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ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112
ANNEALSYS AS-Micro P230323112

ANNEALSYS AS-Micro Semiconductor machine Top seller

34,000 £

Manufacturer ANNEALSYS
Model AS-Micro
Year 2017
Location France FR
Category Semiconductor miscellaneous
Product id P230323112
Language
cs Polovodičový stroj ANNEALSYS AS-Micro
de ANNEALSYS AS-Micro Sondere Halbleiter Maschine
en ANNEALSYS AS-Micro Semiconductor machine
es Máquina semiconductor ANNEALSYS AS-Micro
fr Four RTP ANNEALSYS AS-Micro de 2017 + pompe + ordinateur
it Macchina di semiconduttori ANNEALSYS AS-Micro
pl Maszyna do półprzewodników ANNEALSYS AS-Micro
ru ANNEALSYS AS-Micro Оборудование для полупроводников
tr Yarı İletken Makinası ANNEALSYS AS-Micro
RTP ANNEALSYS AS-Micro oven from 2017 + pump + computer

Perfect condition. Date of 2017.
Delivered with :
- Agilent IDP3A01 vacuum pump and evacuation pump
- control computer, software and user code.
- manual



The AS-Micro is a compact three-inch benchtop thermal processor with vacuum capability dedicated to research applications. It can process substrates from a few square millimetres up to 3 inches in diameter or square. Optional susceptors are available to hold small samples and to process substrates with low infrared absorption.

The quartz tube processing chamber with stainless steel flanges and a tubular furnace with infrared halogen lamps allows processing up to 1250°C with very fast ramp rates (> 250°C/s). The state-of-the-art temperature controller ensures precise temperature control.

Horizontal movement door with quartz tray provides easy access for wafer loading and unloading and thermocouple installation.

Features
Furnace offers the highest ramp rate up to 250°C/s for 2" wafers.
Temperature range: RT to 1250°C
Ramp rate up to 250°C/s on 2 inch diameter silicon substrate, 200°C/s on 3 inch substrate.
Gas mixing capability with mass flow controllers
Vacuum range: Atm to 10-2 Torr (10-6 Torr with optional turbo pump)
Thermocouple temperature control with fast digital PID temperature controller
Full PC control with Windows compatible software

for electrochemistry and nanomaterials semi-conductor / semiconductor / wafer laboratory

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. Exapro recommends to check the details with the seller before a purchase

-------------------
Worked hours
Hours under power
State good
At local norms ---------
Status visible
Client type Reseller
Active since 2015
Offers online 43
Last activity May 30, 2023

Description

RTP ANNEALSYS AS-Micro oven from 2017 + pump + computer

Perfect condition. Date of 2017.
Delivered with :
- Agilent IDP3A01 vacuum pump and evacuation pump
- control computer, software and user code.
- manual



The AS-Micro is a compact three-inch benchtop thermal processor with vacuum capability dedicated to research applications. It can process substrates from a few square millimetres up to 3 inches in diameter or square. Optional susceptors are available to hold small samples and to process substrates with low infrared absorption.

The quartz tube processing chamber with stainless steel flanges and a tubular furnace with infrared halogen lamps allows processing up to 1250°C with very fast ramp rates (> 250°C/s). The state-of-the-art temperature controller ensures precise temperature control.

Horizontal movement door with quartz tray provides easy access for wafer loading and unloading and thermocouple installation.

Features
Furnace offers the highest ramp rate up to 250°C/s for 2" wafers.
Temperature range: RT to 1250°C
Ramp rate up to 250°C/s on 2 inch diameter silicon substrate, 200°C/s on 3 inch substrate.
Gas mixing capability with mass flow controllers
Vacuum range: Atm to 10-2 Torr (10-6 Torr with optional turbo pump)
Thermocouple temperature control with fast digital PID temperature controller
Full PC control with Windows compatible software

for electrochemistry and nanomaterials semi-conductor / semiconductor / wafer laboratory

Please note that this description may have been translated automatically. Contact us for further information. The information of this classified ad are only indicative. Exapro recommends to check the details with the seller before a purchase

Specifications

-------------------
Worked hours
Hours under power
State good
At local norms ---------
Status visible

About this seller

Client type Reseller
Active since 2015
Offers online 43
Last activity May 30, 2023

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ANNEALSYS AS-Micro Semiconductor machine